Electroless Nickel Deposition: An Alternative for Graphene Contacting
نویسندگان
چکیده
منابع مشابه
Electroless Nickel Deposition: An Alternative for Graphene Contacting.
We report the first investigation into the potential of electroless nickel deposition to form ohmic contacts on single layer graphene. To minimize the contact resistance on graphene, a statistical model was used to improve metal purity, surface roughness, and coverage of the deposited film by controlling the nickel bath parameters (pH and temperature). The metalized graphene layers were pattern...
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FexNi100-x thin films were deposited on conductive (Cu) and non-conductive (Pd activated glass) substrate using an electroless, polyol method. The stoichiometry of film composition, as compared to the precursor concentration, strongly depended on the substrate position. When the substrate was immersed in the refluxing solution, Fe-deficient films were deposited. However Fe-rich films were synth...
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In this work, nickel thin films were deposited on texture silicon by electroless plated deposition. The electroless-deposited Ni layers were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy dispersive x-ray spectroscopy (EDS), X-ray diffraction analysis (XRD), and sheet resistance measurement. The results indicate that the dominant phase was Ni...
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Article history: Received 4 June 2012 Accepted in revised form 30 March 2013 Available online 6 April 2013
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The pretreatment of the substrate, prior to Electroless Nickel (EN) plating, plays an important role in the corrosion protection provided by the EN deposit. Many factors in the pretreatment process can affect the corrosion resistance of the EN deposit. The details of mechanical treatment, chemical/elecuo polishing, acid activation, and pre-processing procedure (such as nickel strike) are among ...
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ژورنال
عنوان ژورنال: ACS Applied Materials & Interfaces
سال: 2016
ISSN: 1944-8244,1944-8252
DOI: 10.1021/acsami.6b08290